<p><span>The incessant scaling of complementary metal-oxide semiconductor (CMOS) technology has resulted in significant performance improvements in very-large-scale integration (VLSI) design techniques and system architectures. This trend is expected to continue in the future, but this requires brea
Nanoelectronics for Next-Generation Integrated Circuits
โ Scribed by Rohit Dhiman
- Publisher
- CRC Press
- Year
- 2023
- Tongue
- English
- Leaves
- 299
- Category
- Library
No coin nor oath required. For personal study only.
โฆ Table of Contents
Cover
Half Title
Title Page
Copyright Page
Dedication
Table of Contents
Preface
Acknowledgments
List of Contributors
About the Editor
Chapter 1 Emerging Graphene-Based Electronics: Properties to Potentials
1.1 Introduction
1.2 Simulation Methodology for Self-Healing Studies
1.3 Self-Healing of Pristine and Pre-Existing Defective Graphene Sheets
1.4 Possible Application of the Self-Healing Phenomenon of Graphene
1.5 Magnetic Phase Transitions
1.6 Conclusions
References
Chapter 2 Models for Modern Spintronics Memories with Layered Magnetic Interfaces
2.1 Introduction
2.2 Advanced Spintronics Memories
2.2.1 Modern Spintronics Memories
2.2.2 VCMA Model
2.2.3 The Rashba SOI Model
2.3 Magnetic Layered Interfaces for TST-MRAM
2.3.1 HM/FM Interfacial Modulation for Strong PMA
2.3.2 PMA in Cobalt-Dependent Multilayers
2.3.3 PMA in FM/Co-Fe-B/MgO Structures
2.3.4 PMA in HM/CoFeB/NM/MgO Structures
2.4 Future Trends in Spintronics Memory
References
Chapter 3 Evaluation of Magnetic Anisotropy via Intrinsic Spin Infusion
3.1 Introduction
3.2 Spin Infusion in MTJ and Effective Torque
3.2.1 Spin Infusion in MTJ
3.2.2 Spin Torque
3.2.2.1 Magnetic Field Torque
3.2.2.2 Damping Torque
3.2.2.3 Spin-Transfer Torque
3.3 Spin-Infusion Magnetic Switching
3.3.1 Expansion of the Precession
3.3.2 Cylindrical Pillar With Uniaxial Anisotropy
3.3.3 Linearized LLG Equation
3.4 Other Techniques in Spin-Dependent Computation
References
Chapter 4 Quantum-Dot Cellular Automata (QCA) Nanotechnology for Next-Generation Systems
4.1 Introduction
4.2 Background
4.3 Full Adder Using QCA Nanotechnology
4.4 Comparison Analysis
4.5 Conclusion
References
Chapter 5 An Overview of Nanowire Field-Effect Transistors for Future Nanoscale Integrated Circuits
5.1 ZnO/CuO/PbS NW FETs
5.2 III-V NANOWIRE FETs
5.3 III-V NANOWIRE TFETs
5.4 JL NW FETs
5.5 NW NCFETs
5.6 Reconfigurable NW FETs
5.7 Reliability Issues in NW FETs
5.8 Si NW FETs
5.9 Summary
References
Chapter 6 Investigation of Tunnel Field-Effect Transistors (TFETs) for Label-Free Biosensing
6.1 Introduction
6.2 Sensitivity Analysis
6.3 Case Study 1: Dual-Gate Source Electrode Dielectrically Modulated TFETs for Biosensing Application
6.4 Case Study 2: Source Electrode Hetero-Material Dielectrically Modulated TFETs for Biosensing Application
6.5 Conclusions
References
Chapter 7 Analog and Linearity Analysis of Vertical Nanowire TFET
7.1 Introduction
7.2 Types of Devices
7.3 Results and Discussion
7.3.1 Linear Parameters Analysis
7.3.2 Analog Parameters Analysis
7.4 Conclusions
References
Chapter 8 Effects of Variation in Gate Material on Enhancement Mode P-GaN AlGaN/GaN HEMTs
8.1 Introduction
8.2 Power Devices
8.3 Gallium Nitride
8.4 High Electron Mobility Transistor (HEMT)
8.4.1 Conventional HEMT Structure
8.4.2 Source of Two-Dimensional Electron Gas
8.4.3 Band Diagram of a Conventional HEMT
8.4.4 Normally-Off HEMT
8.5 Simulation and Results
8.6 Conclusion
8.7 Future Scope
References
Chapter 9 Electrical Modeling of One Selector-One Resistor (1S-1R) for Mitigating the Sneak-Path Current in a Nano-Crossbar Array
9.1 Introduction to the RRAM Models and Their Potential Challenges
9.1.1 RRAM Technology โ Background Studies and Current Research Development
9.1.2 RRAM Crossbar Array Formation and Sneak-Path Current
9.2 Methods to Mitigate Sneak-Path Current in RRAM Arrays
9.2.1 Associating a Selector Device With Memory Unit (1S-1R): A Literature Review
9.3 Implementation of an Electrical Model of Selector Device and RRAM Device
9.3.1 Electrical Modeling of a Selector Device
9.3.2 Electrical Model Implementation of a Pt/Ta2O5/TaOx/Pt RRAM Device Incorporating the Current Through the Outside of the Conduction Filament (OCF)
9.4 Integrated Modeling of the Proposed Selector Model with the RRAM Model
9.4.1 Analysis and Results
9.5 Formation and Sneak-Path Current Measurement of 2 ร 2 CBA of 1S-1R With a Pt/Ta2O5/TaOx/TiO2/Pt Selector and Pt/Ta2O5/TaOx/Pt RRAM
References
Chapter 10 SRAM: An Essential Part of Integrated Circuits
10.1 Introduction
10.2 Application Windows
10.2.1 IoT-Enabled Wireless Sensor Networks
10.2.2 Multimedia Applications
10.2.3 High-Performance Processors
10.3 Conventional SRAM Cell
10.3.1 Device Sizing Strategy for Functional 6T SRAM Cell
10.3.2 Memory Architecture
10.4 Major Design Challenges of SRAM Memory for Modern Integrated Circuits
10.4.1 Process Variation Effects
10.4.2 Temperature Variation Effect on Read and Write Ability
10.4.3 Read/Write Conflict and Read-Decoupled 8T SRAM Cell
10.4.4 Read Current to Leakage Current Ratio (IRead/ILeak)
10.4.5 Performance and Stability Trade-off
10.4.6 Half-Select Issue
10.5 Various Approaches to Solve the Design Issues of Conventional Bit Cells
10.6 Low-Voltage Highly Stable 12T SRAM Cell Design for WSNs
10.7 In-Memory Computing for the Modern AI Edge Devices and its Challenges
10.7.1 Key Challenges of In-Memory Computing
10.8 Conclusion
References
Chapter 11 Implementation of 512-bit SRAM Tile Using the Lector Technique for Leakage Power Reduction
11.1 Introduction
11.2 Literature Review
11.3 Static Random-Access Memory (SRAM) โ Architecture and Operation
11.3.1 SRAM Architecture
11.3.2 Read Operation
11.3.3 Write Operation
11.4 The Lector Technique
11.4.1 Applying the Lector Technique to SRAM
11.5 Results and Discussion
11.6 Conclusion
Acknowledgment
References
Chapter 12 Characterization of Stochastic Process Variability Effects on Nano-Scale Analog Circuits
12.1 Introduction
12.2 Background Concepts
12.2.1 Randomness of Circuit Parameters and Circuit Performance Parameters
12.2.2 Major Sources of Stochastic Process Variability
12.2.2.1 Random Discrete Dopant Effect
12.2.2.2 Line Edge/Line Width Roughness
12.2.2.3 Oxide Thickness Variations
12.2.3 Numerical Measures of Descriptive Statistics
12.3 Statistical Characterization Methodology for Stochastic Process Variability
12.3.1 Identification of the Berkeley Simulation IGFET Model (BSIM) Compact Model Parameters to Stochastic Process Variabilities
12.3.2 Sample Design
12.3.3 Data Collection Through Designed Experiment
12.3.4 Sample Statistics and Measures
12.4 Implementation of the Methodology
12.4.1 Systematic Process Variability
12.4.2 Stochastic Process Variability
12.5 Application Example: Current Reference Circuit for Ultra-Low Power Analog Applications
12.5.1 Characterization of Systematic Process Variability
12.5.2 Characterization of Stochastic Process Variability
12.5.2.1 Oxide Thickness Variations
12.5.2.2 Threshold Voltage Variations
12.6 Conclusion
Acknowledgment
References
Chapter 13 Versatile Single Input Single Output Filter Topology Suitable for Integrated Circuits
13.1 Introduction
13.2 Theoretical Details Of The Proposed Filter
13.2.1 Working Principle of EXCCII
13.2.2 Proposed SISO filter topology
13.3 Filter Functionalities Derived From Proposed SISO Filter Topology
13.3.1 First-Order AP Filter
13.3.2 Second-Order AP Filter and Notch Filter
13.4 Non-Ideal Analysis of the Proposed SISO Filter Topology
13.5 Simulation Results
13.6 Conclusion
References
Chapter 14 Secured Integrated Circuit (IC/IP) Design Flow
14.1 Introduction
14.2 Discussion of Contemporary Approaches
14.3 Structural Obfuscation of IP Cores
14.3.1 The Basic Definition and Threat Model of Structural Obfuscation
14.3.2 Why Performing SO during HLS is Beneficial?
14.3.3 Description of Multi-Stage Structural Obfuscation Process (Sengupta et al., 2017)
14.4 Functional Obfuscation of DSP IP Cores
14.4.1 Reverse Engineering Attacks during the Various Stages of IP Core Design
14.4.2 Attack Scenarios
14.4.3 Functional Obfuscation Approach for DSP Cores
14.4.4 Handling Attacks
14.5 Hardware Watermarking
14.5.1 Features of the Multi-Variable Watermarking Approach (Bhadauria And Sengupta, 2016) for Signature Insertion During High-Level Synthesis
14.5.2 Signature Encoding Mechanism in Multi-Variable Watermarking Approach (Bhadauria and Sengupta, 2016)
14.5.3 Process of Watermark Creation for an IP Core Using a Multi-Variable Signature (Bhadauria and Sengupta, 2016)
14.5.4 Motivation for Performing Design Space Exploration of an Optimal Watermark
14.5.5 Resolving Attacks and Ownership Problems through a Multi-Variable Watermark Approach (Bhadauria and Sengupta, 2016)
14.5.6 Properties/Metrics of Watermark Generated through Multi-Variable Watermarking Approach (Bhadauria and Sengupta, 2016)
14.6 Conclusion
References
Index
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