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Nanocrystalline silicon deposition at high rate and low temperature from pure silane in a modified ICP-CVD system

✍ Scribed by Tian, Lin; Fathi, Ehsanollah; Tarighat, Roohollah S; Sivoththaman, Siva


Book ID
121437743
Publisher
Institute of Physics
Year
2013
Tongue
English
Weight
717 KB
Volume
28
Category
Article
ISSN
0268-1242

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