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Nanocrystalline Si : H thin films grown at room temperature with plasma-enhanced chemical vapour deposition at a very high pressure

✍ Scribed by Gao, L; Lu, N P; Liao, L G; Ji, A L; Cao, Z X


Book ID
121363293
Publisher
Institute of Physics
Year
2012
Tongue
English
Weight
760 KB
Volume
45
Category
Article
ISSN
0022-3727

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