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n+-InP(silicon implanted)/p-InP homojunction: Minority carrier diffusion length in the implanted layer

✍ Scribed by L. Gouskov; A.L. Conjeaud; A. Dhouib; P.N. Favennec; M. Salvi; H. L'Haridon; G. Bastide; D. Bayaa


Publisher
Elsevier Science
Year
1984
Weight
466 KB
Volume
11
Category
Article
ISSN
0379-6787

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