✦ LIBER ✦
Multideposition Multiroom-Temperature Annealing via Ultraviolet Ozone for HfZrO High- and Integration With a TiN Metal Gate in a Gate-Last Process
✍ Scribed by Ling Wu; HongYu Yu; Yew, K.S.; Jisheng Pan; Liu, W.J.; Tían Li Duan
- Book ID
- 114620480
- Publisher
- IEEE
- Year
- 2011
- Tongue
- English
- Weight
- 755 KB
- Volume
- 58
- Category
- Article
- ISSN
- 0018-9383
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