In Issue 5, 2ooo we looked at the technical and business trends in etch processes for manufacturing gallium arsenide electronic devices. Here we turn to the application of dry etching to fabrication of optoelectronic devices -a much broader area (covering GaAs, lnP as well as GaN and II-Vl materials
โฆ LIBER โฆ
Multichamber processing for optoelectronics
โ Scribed by L.R. Harriott; M.A. Cotta; H. Temkin; R.A. Hamm; A. Feygenson; D. Ritter; Y.L. Wang
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 795 KB
- Volume
- 25
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.
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