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Morphology of Thick SiC Epitaxial Films Grown by the Physical Vapor Transport Method

✍ Scribed by B.P. Wagner; N.B. Singh; A. Berghmans; D.J. Knuteson; D. Kahler; S. McLaughlin; J. Hawkins; J. Golombeck


Book ID
107455097
Publisher
Springer US
Year
2008
Tongue
English
Weight
465 KB
Volume
37
Category
Article
ISSN
0361-5235

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Thermoelectric properties of SiC thick f
✍ X.H Wang; A Yamamoto; K Eguchi; H Obara; T Yoshida πŸ“‚ Article πŸ“… 2003 πŸ› Institute of Physics and National Institute of Mat 🌐 English βš– 348 KB

SiC thick films of about 300 mm could be prepared with a deposition rate above 300 nm/s by thermal plasma physical vapor deposition (TPPVD) using ultrafine SiC powder as a starting material. The thermoelectric properties were investigated as a function of composition and doping content. The nondoped