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Monte Carlo simulation of a ballistic selective etching process in (2+1) dimensions

โœ Scribed by A.P. Reverberi; A.G. Bruzzone; L. Maga; A. Barbucci

Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
277 KB
Volume
354
Category
Article
ISSN
0378-4371

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We study weak localization effects in the ballistic regime as induced by man-made scatterers. Specular reflection of the electrons off these scatterers causes backscattered trajectories to occur, which interfere with their time-reversed path resulting in weak localization corrections to the resistan