Integration of enhancement and depletion
Integration of enhancement and depletion-mode AlGaN/GaN MIS-HFETs by fluoride-based plasma treatment
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Wang, Ruonan ;Cai, Yong ;Tang, Wilson C. W. ;Lau, Kei May ;Chen, Kevin J.
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Article
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2007
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John Wiley and Sons
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English
⚖ 310 KB
## Abstract Enhancement‐mode AlGaN/GaN metal–insulator–semiconductor HFETs (MIS‐HFETs) are demonstrated by combining CF~4~ plasma treatment technique and a two‐step Si~3~N~4~ deposition process. The threshold voltage has been shifted from –4 to 2 V using this technique. A 15 nm Si~3~N~4~ layer is i