✦ LIBER ✦
Monemolecular resists: a new class of high resolution resists for electron beam microlithography : A. Barraud, C. Rosilio and A. Ruaudel-Teixier. Solid St. Technol. p. 120 (August 1979)
- Publisher
- Elsevier Science
- Year
- 1980
- Tongue
- English
- Weight
- 122 KB
- Volume
- 20
- Category
- Article
- ISSN
- 0026-2714
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