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Molecular simulation study on adhesions and deformations for Polymethyl Methacrylate (PMMA) resist in nanoimprint lithography

✍ Scribed by Sungjin Kwon; Youngmin Lee; Jaeshin Park; Seyoung Im


Book ID
107625250
Publisher
Springer-Verlag
Year
2011
Tongue
English
Weight
736 KB
Volume
25
Category
Article
ISSN
1738-494X

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