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Molecular dynamics simulations of low-energy argon ion sputtering of copper clusters on polyethylene surfaces

✍ Scribed by O.A. Yermolenko; G.V. Kornich; G. Betz

Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 672 KB
Volume: 269
Category: Article
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2010.11.081

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✦ Synopsis

The normal bombardment of the targets consisted of single 13-, 27-or 39-atom copper cluster on a surface of polyethylene by Ar ions with energies of 100, 200 and 400 eV is examined using molecular dynamics simulation incorporating long-range many-body covalent bonding potential for hydrocarbons and a potential based on a embedded atom model for copper. Sputtering yield and its dependence on the energy of bombarding ion and size of the pre-deposited copper cluster are discussed.

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