Molecular dynamics simulation of gel for
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G.P. Patsis; N. Glezos
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Article
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1999
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Elsevier Science
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English
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The knowledge of the structural changes that occur during the lithographic process using chemically amplified resists (CARs) is of great importance in process and resist optimization. Molecular dynamics (MD) is a suitable method for the simulation of these microscopic changes. A detailed description