A designed experiment was performed to match the arsenic implant dose of two implanters during integrated circuit manufacture. Implanter dose mismatch is usually the largest contributor to variability in an important electrical parameter of an integrated circuit, the p-channel transistor threshold v
Moisture absorption modeling using design of experiments
β Scribed by Virginia Yong; H. Thomas Hahn
- Publisher
- John Wiley and Sons
- Year
- 2006
- Tongue
- English
- Weight
- 279 KB
- Volume
- 103
- Category
- Article
- ISSN
- 0021-8995
No coin nor oath required. For personal study only.
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