Modification of materials by high energy plasma ions

✍ Scribed by A. Lorusso; F. Belloni; D. Doria; V. Nassisi; J. Wolowski; J. Badziak; P. Parys; J. Krása; L. Láska; F.P. Boody; L. Torrisi; A. Mezzasalma; A. Picciotto; S. Gammino; L. Calcagnile; G. Quarta; D. Bleiner

• Publisher: Elsevier Science
• Year: 2005
• Tongue: English
• Weight: 173 KB
• Volume: 240
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2005.06.121

✦ Synopsis

The high-power iodine laser of the Prague Asterix Laser System (PALS), emitting radiation at 438 nm wavelength, 400 ps pulse duration and about 250 J maximum pulse energy, was employed to irradiate in vacuum a germanium target. The amount, the energy and the charge state of the ions emitted from the laser-produced plasma are analyzed by time-of-flight measurements performed with the use of ion collectors (ICs) and an electrostatic ion energy analyzer (IEA). Energetic Ge ions emitted from the laser-produced plasma were directly implanted into C substrates placed at 30 cm distance from the target and 30°angle with respect to the normal to the target surface. The implantation depths and implanted doses were analyzed by two different techniques: the Rutherford backscattering spectrometry (RBS) and the laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS).