The modelling of a new 300 mm rapid thermal processing (RTP) system is described. Conventional raytracing techniques are used to determine lamp intensity distributions on both 200 and 300 mm wafers. Simulation results are veriยฎed using the `dierence method' (dierence between two process parameter di
โฆ LIBER โฆ
Modelling of rapid thermal processing
โ Scribed by P. Vandenabeele; K. Maex
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 637 KB
- Volume
- 10
- Category
- Article
- ISSN
- 0167-9317
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