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Modeling the fringing electric field effect on the threshold voltage of FD SOI nMOS devices with the LDD/sidewall oxide spacer structure

✍ Scribed by Lin, S.C.; Kuo, J.B.


Book ID
114617219
Publisher
IEEE
Year
2003
Tongue
English
Weight
449 KB
Volume
50
Category
Article
ISSN
0018-9383

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