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Modeling of the radicalary state in the H2O2/UV oxidation system to predict the degradation kinetics of phenolic mixture solutions

✍ Scribed by Ana De Luis; José Ignacio Lombraña; Amaia Menéndez

Publisher
American Institute of Chemical Engineers
Year
2010
Tongue
English
Weight
312 KB
Volume
30
Category
Article
ISSN
1944-7442

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