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Modeling of Si Etching Under Effects of Plasma Molding in Two-Frequency Capacitively Coupled Plasma in $\hbox{SF}_{6}/\hbox{O}_{2}$ for MEMS Fabrication
✍ Scribed by Hamaoka, Fukutaro; Yagisawa, Takashi; Makabe, Toshiaki
- Book ID
- 118194537
- Publisher
- IEEE
- Year
- 2007
- Tongue
- English
- Weight
- 896 KB
- Volume
- 35
- Category
- Article
- ISSN
- 0093-3813
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