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Modeling of Film Deposition for Microelectronic Applications

✍ Scribed by Stephen Rossnagel (Eds.)

Publisher
Academic Press, Elsevier
Year
1996
Leaves
294
Series
Thin Films 22
Category
Library
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✦ Table of Contents

Content:
Contributors
Page ix

Preface
Pages xi-xiv
Stephen Rossnagel

Thin film microstructure and process simulation using SIMBAD Original Research Article
Pages 1-79
Michael J. Brett, Steven K. Dew, Tom J. Smy

Mathematical methods for thin film deposition simulations Original Research Article
Pages 81-115
S. Hamaguchi

A process model for sputter deposition of thin films using molecular dynamics Original Research Article
Pages 117-173,IN1-IN3
C.-C. Fang, V. Prasad, R.V. Joshi, F. Jones, J.J. Hsieh

Feature scale transport and reaction during low-pressure deposition processes Original Research Article
Pages 175-276
Timothy S. Cale, Vadali Mahadev

Author index
Pages 277-283

Subject index
Pages 285-290

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