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Modeling of an inductively coupled plasma at reduced pressures

✍ Scribed by S. H. Paik; E. Pfender


Publisher
Springer
Year
1990
Tongue
English
Weight
636 KB
Volume
10
Category
Article
ISSN
0272-4324

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We carried out the modeling of chemical reactions in a silane-containing remote Inductively Coupled Plasma Enhanced Chemical Vapor Deposition (ICPECVD) system, intended for deposition of silicon, silicon oxide, and silicon nitride layers. The required electron densities and Electron Energy Distribut