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Modeling and optimization of thermal-flow lithography process using a neural-genetic approach

✍ Scribed by Te-Sheng Li; Szu-Hung Chen

Publisher: Springer US
Year: 2009
Tongue: English
Weight: 417 KB
Volume: 22
Category: Article
ISSN: 0956-5515
DOI: 10.1007/s10845-009-0271-0

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