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Model for in-situ etching and selective epitaxy of AlxGa1-xAs with HCI gas by metalorganic vapor phase epitaxy

โœ Scribed by Katsushi Fujii; Kenji Shimoyama; Hiroshi Miyata; Yuichi Inoue; Nobuyuki Hosoi; Hideki Gotoh


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
513 KB
Volume
145
Category
Article
ISSN
0022-0248

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