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MOCVD of Aluminum Oxide/Hydroxide onto Organic Self-Assembled Monolayers

✍ Scribed by Peter Wohlfart; Jurij Weiß; Josua Käshammer; Maximilian Kreiter; Carl Winter; Roland Fischer; Silvia Mittler-Neher

Publisher: John Wiley and Sons
Year: 1999
Tongue: English
Weight: 345 KB
Volume: 5
Category: Article
ISSN: 0948-1907
DOI: 10.1002/(sici)1521-3862(199908)5:4<165::aid-cvde165>3.0.co;2-q

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✦ Synopsis

We demonstrate the deposition of Al x O y H z onto hydroxy-terminated self-assembled monolayers. The layer structure is investigated by Fourier transform infrared (FTIR) spectroscopy, spontaneous desorption time-of-flight mass spectrometry, and surface plasmon spectroscopy. It is found that the organic self-assembled monolayer remains intact during deposition and the film thickness of the aluminum oxide and hydroxide films can be adjusted by varying the deposition time. The new aluminum hydroxide surface was used for a second self-assembly process with dodecanoic acid.

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