Mixed-sputter deposition of Ni-Ti-Cu shape memory films
โ Scribed by P. Krulevitch; P.B. Ramsey; D.M. Makowiecki; A.P. Lee; M.A. Northrup; G.C. Johnson
- Publisher
- Elsevier Science
- Year
- 1996
- Tongue
- English
- Weight
- 643 KB
- Volume
- 274
- Category
- Article
- ISSN
- 0040-6090
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๐ SIMILAR VOLUMES
Since the transition temperature of the shape memory effect in Ni,Ti 1 ,. films depends on the composition of the layer, it is indispensable to have an accurate control on their composition. We are now able to control in situ the composition of r.f. sputtered Ni Ti films in the whole domain of shape
Thin films of Cu-26.9 at.% Al-5.5 at.% Ni were grown by dc magnetron sputtering from the alloy target previously melted in an induction furnace. The films were grown either on glass or (1 0 0)Si substrates at room temperature. The films, of approximately 3 m thickness, were peeled off from the subst