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Minimizing the Carbon Content of Thin Ruthenium Films by MOCVD Precursor Complex Design and Process Control

✍ Scribed by A. Schneider; N. Popovska; I. Jipa; B. Atakan; M. A. Siddiqi; R. Siddiqui; U. Zenneck


Publisher
John Wiley and Sons
Year
2007
Tongue
English
Weight
502 KB
Volume
13
Category
Article
ISSN
0948-1907

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