Minimizing damage and contamination in RIE processes by extracted-plasma-parameter analysis : Takeo Yamshitaet al. IEEE Transactions on Semiconductor Manufacturing5(3), 223 (1992)

• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 61 KB
• Volume: 33
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(93)90246-u