Microwave ECR plasma CVD of cubic Y2O3 coatings and their characterization

✍ Scribed by S.A. Barve; Jagannath; N. Mithal; M.N. Deo; N. Chand; B.M. Bhanage; L.M. Gantayet; D.S. Patil

• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 729 KB
• Volume: 204
• Category: Article
• ISSN: 0257-8972
• DOI: 10.1016/j.surfcoat.2010.03.003

✦ Synopsis

Yttrium oxide (Y 2 O 3 ) thin films are deposited by microwave electron cyclotron resonance (ECR) plasma assisted metal organic chemical vapour deposition (MOCVD) process at a substrate temperature of 350 °C using indigenously developed metal organic precursors (2,2,6,6-tetra methyl-3,5-heptane dionate) yttrium, commonly known as Y(thd) 3 synthesized by ultrasound method. The deposited coatings are characterized by X-ray photoelectron spectroscopy, glancing angle X-ray diffraction, scanning electron microscopy, EDS and infrared spectroscopy. The characterization results indicate that it is possible to deposit non-porous coatings with excellent uniformity of a single phase cubic Y 2 O 3 on various substrates by this process at reasonably low substrate temperature that is desirable in various manufacturing processes.