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Microstructure and oxidation kinetics of intermetallic TiAl after Si- and Mo- ion implantation

✍ Scribed by U Hornauer; E Richter; W Matz; H Reuther; A Mücklich; E Wieser; W Möller; G Schumacher; M Schütze

Book ID
108422729
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
310 KB
Volume
128-129
Category
Article
ISSN
0257-8972

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Ion Implantation as a tool to study the
Ion Implantation as a tool to study the oxidation behaviour of TiAl-based intermetallics
✍ Dr. M. F. Stroosnijder; Dr. H. J. Schmutzler; Dr. V. A. C. Haanappel; Dr. J. D. 📂 Article 📅 1997 🏛 John Wiley and Sons 🌐 German ⚖ 972 KB

## Abstract TiAl‐based Intermetallic alloys are being considered as structural materials for high‐temperature applications due to their low density and substantial mechanical strength at high temperatures. The effect of various elements added by ion implantation on the oxidation behaviour of near‐γ