Microstructural modifications induced by rapid thermal annealing in plasma deposited SiO[sub x]N[sub y]H[sub z] films

✍ Scribed by del Prado, A.; San Andrés, E.; Mártil, I.; González-Dı́az, G.; Bravo, D.; López, F. J.; Fernández, M.; Martı́nez, F. L.

• Book ID: 121509183
• Publisher: American Institute of Physics
• Year: 2003
• Tongue: English
• Weight: 326 KB
• Volume: 94
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.1586979