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Microstructural characterization of laser nitrided titanium

โœ Scribed by A.B. Kloosterman; J.Th.M. De Hosson

Book ID
116165043
Publisher
Elsevier Science
Year
1995
Weight
616 KB
Volume
33
Category
Article
ISSN
0956-716X

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Titanium nitride (TiN) films were deposited onto Ti-6Al-4V substrates by laser chemical vapor deposition using a cw CO 2 laser and TiCl 4 , N 2 and H 2 reactant gases. Laser-induced fluorescence (LIF) and pyrometry determined relative titanium gas phase atomic number density and deposition temperatu