Microelectronic Applications of Chemical Mechanical Planarization || Corrosion Inhibitor for Cu CMP Slurry

✍ Scribed by Li, Yuzhuo

• Publisher: John Wiley & Sons, Inc.
• Year: 2007
• Weight: 440 KB
• Edition: 1
• Category: Article
• ISBN: 0471719196
• DOI: 10.1002/9780470180907.ch8