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MeV Si ion beam implantation as an effective patterning tool for the localized formation of porous silicon

✍ Scribed by E. Punzón-Quijorna; V. Torres-Costa; M. Manso-Silván; R.J. Martín-Palma; A. Climent-Font


Book ID
113823660
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
474 KB
Volume
282
Category
Article
ISSN
0168-583X

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