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Method of sealing pores in porous low-kSiOC(-H) films fabricated using plasma-assisted atomic layer deposition

✍ Scribed by Chang Young Kim, Hong Seok Lee, Chi Kyu Choi…


Book ID
120798444
Publisher
The Korean Physical Society
Year
2013
Tongue
English
Weight
388 KB
Volume
62
Category
Article
ISSN
0374-4884

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