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Metastable surface layer of a silicon nitride thin film growing by photo-chemical vapor deposition

✍ Scribed by Toshimasa Wadayama; Wataru Suëtaka


Book ID
118362649
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
411 KB
Volume
218
Category
Article
ISSN
0039-6028

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Silicon nitride films of various compositions have been deposited on silicon substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD) technique from mixtures of Ar, N and SiH as precursors. Film 2 4 composition and refractive index as a function of deposition p