Metastable ion study of organosilicon compounds. Part XIV—trimethylsilylacetic acid, (CH3)3SiCH2COOH, and its methyl ester, (CH3)3SiCH2COOCH3

✍ Scribed by Susumu Tajima; Daisuke Watanabe; Satoshi Nakajima; Osamu Sekiguchi; Nico M. M. Nibbering

• Publisher: John Wiley and Sons
• Year: 2002
• Tongue: English
• Weight: 127 KB
• Volume: 37
• Category: Article
• ISSN: 1076-5174
• DOI: 10.1002/jms.284

✦ Synopsis

Abstract

The unimolecular metastable decompositions of trimethylsilylacetic acid, (CH~3~)~3~SiCH~2~COOH (1), and its methyl ester, (CH~3~)~3~SiCH~2~COOCH~3~ (2), were investigated by mass‐analyzed ion kinetic energy (MIKE) spectrometry in conjunction with thermochemical data. The abundance of the molecular ions of both compounds, generated by electron ionization, is extremely low. However, the abundance of the ions generated by the loss of ^.^CH~3~ and observed at m/z 117 and 131 is moderate. These fragment ions further decompose to form the most abundant m/z 75 and 89 ions, respectively, by the loss of CH~2~CO through a (CH~3~)~2~Si group migration. The loss of CH~2~CO is also observed to occur from 2^+.^ and its fragment ion at m/z 115 generated by the loss of ^.^OCH~3~. The former reaction is proposed to occur via an ion–radical complex. Copyright © 2002 John Wiley & Sons, Ltd.