Metastable ion study of organosilicon compounds. Part V—tetramethoxysilane and trimethoxymethylsilane

✍ Scribed by Eiichi Tabei; Shigeru Mori; Fumio Okada; Susumu Tajima; Kazuo Ogino; Yuzuru Okawara; Seiji Tobita

• Publisher: John Wiley and Sons
• Year: 1992
• Tongue: English
• Weight: 438 KB
• Volume: 27
• Category: Article
• ISSN: 1076-5174
• DOI: 10.1002/oms.1210270611

✦ Synopsis

The fragmentations of tetramethoxysilane ((CH,O),Si (1)) and trimetboxymetbylsilaw ((CH,O),SiCH, (3)) induced by electron impact were investigated by mass-amlysed ion kinetic energy (MIKE) spectrometry and a deuterium-labelling study. These molecular ioas begin to fragment by the loss of CH3 or CH,O. These fmgmentations are followed by the loss of an aldehyde molecule (H,CO), as commonly observed in the mass spectra of alkoxysilanes Almost complete scrambling of the metboxy hydrogens takes place in the metastable molecular ion, 11 I +*, prior to the decomposition. On the other hand, a moderate extent of scrambling of the hydrogens takes place in 131". The fragmentations of 111" and 131'' were compared with those of the corresponding carbon analogws, tetrametboxymethaw ((CH,O),C (2)) and l,l,l-trimethoxyetbane ((CH,O),CCH, (4)), respectively.