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Metalorganic chemical vapor deposition of lead-free ferroelectric BiFeO[sub 3] films for memory applications

✍ Scribed by Yang, S. Y.; Zavaliche, F.; Mohaddes-Ardabili, L.; Vaithyanathan, V.; Schlom, D. G.; Lee, Y. J.; Chu, Y. H.; Cruz, M. P.; Zhan, Q.; Zhao, T.

Book ID: 121719201
Publisher: American Institute of Physics
Year: 2005
Tongue: English
Weight: 682 KB
Volume: 87
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.2041830

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