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Metallorganic chemical vapor deposition of metallic Ru thin films on biaxially textured Ni substrates using a Ru(EtCp)2 precursor

✍ Scribed by Hu-Yong Tian; Helen-Lai-Wa Chan; Chung-Loong Choy; Jong-Wan Choi; Kwang-Soo No

Book ID: 113781323
Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 512 KB
Volume: 93
Category: Article
ISSN: 0254-0584
DOI: 10.1016/j.matchemphys.2005.03.002

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