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Metal-oxide-semiconductor characteristics of rapid thermal processed chemical vapor deposited SiO2 gate dielectrics

✍ Scribed by W. Ting; P.C. Li; G.Q. Lo; J. Lee; D.L. Kwong


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
267 KB
Volume
34
Category
Article
ISSN
0038-1101

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