✦ LIBER ✦
Metal carbide-induced negative flatband voltage shift in TaCx and HfCx/HfO2 gate stacks
✍ Scribed by Wataru Mizubayashi; Koji Akiyama; Wenwu Wang; Minoru Ikeda; Kunihiko Iwamoto; Yuuichi Kamimuta; Akito Hirano; Hiroyuki Ota; Toshihide Nabatame; Akira Toriumi
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 651 KB
- Volume
- 254
- Category
- Article
- ISSN
- 0169-4332
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