Mesoscopic Patterning in Thin Polymer Films Formed under the Fast Dip-Coating Process
✍ Scribed by Edward Bormashenko; Roman Pogreb; Oleg Stanevsky; Yelena Bormashenko; Tamir Stein; Vladimir-Zeev Gaisin; Ron Cohen; Oleg V. Gendelman
- Publisher
- John Wiley and Sons
- Year
- 2005
- Tongue
- English
- Weight
- 558 KB
- Volume
- 290
- Category
- Article
- ISSN
- 1438-7492
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✦ Synopsis
Abstract
Summary: Mesoscopically ordered self‐assembled polystyrene, polycarbonate and poly(methyl methacrylate) films were obtained when polymer solutions were deposited on vertical plates and dried with hot air. It was shown that characteristic size (≈50 μm) of the mesoscopic cell is practically insensitive to the polymer or substrate kind, while the thickness of the substrate plays a decisive role in the mesoscopic patterning. Junction angles of 120 and 90° were observed. Marangoni instability plays an important role in the cell's structure formation. A semi‐quantitative model explaining the phenomenon of mesoscopic cell formation is proposed.
Scheme of the dip‐coating process.
imageScheme of the dip‐coating process.