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Melting threshold of crystalline and amorphized Si irradiated with a pulsed ArF (193 nm) excimer laser

✍ Scribed by F. Foulon; E. Fogarassy; A. Slaoui; C. Fuchs; S. Unamuno; P. Siffert


Publisher
Springer
Year
1988
Tongue
English
Weight
358 KB
Volume
45
Category
Article
ISSN
1432-0630

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