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Mechanisms of Accelerated Oxidation of Copper in the Presence of Molten Oxides

✍ Scribed by V. V. Belousov

Publisher
Springer-Verlag
Year
2007
Tongue
English
Weight
756 KB
Volume
67
Category
Article
ISSN
0030-770X

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The effect of trace oxygen on the annealing of Cu / Ta(N) / SiO / Si(001) damascene structures was studied. ## 2 The dry oxidation of copper was investigated by annealing the wafers at 420 8C for 20 min in N ambients with 2 oxygen concentrations ranging from 0 to 2500 ppm in a Rapid Thermal Proce