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Mechanisms for reactions of halogenated compounds. Part 3. Variation in activating influence of halogen substituents in nucleophilic aromatic substitution

โœ Scribed by Chambers, Richard D.; Close, Deborah; Williams, D. Lyn H.


Book ID
120584186
Publisher
Royal Society of Chemistry
Year
1980
Tongue
English
Weight
375 KB
Volume
5
Category
Article
ISSN
1472-779X

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Substituent effects and stereochemical m
โœ R. Subramonia Iyer; F.S. Rowland ๐Ÿ“‚ Article ๐Ÿ“… 1973 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 235 KB

No thermal substitutions of '\*F for X (X = halogen atom) are obsened with CF,X and (CH&\_&H,X substrates in ex&ss SF,. The absence of thermal yield increasing with weaker C-X bond energies, as found with CHjX substrates, is attributed to the much larger mass versus H of F and CH3 abstituents. The