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Mechanism of the Activation of 1,1,3,3-Tetramethyl-1,3-disilacyclobutane in Plasma Chemical Vapor Deposition

โœ Scribed by Wrobel, A. M.; Stanczyk, W.


Book ID
120395070
Publisher
American Chemical Society
Year
1994
Tongue
English
Weight
582 KB
Volume
6
Category
Article
ISSN
0897-4756

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