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Mechanism of redox reactions at semiconductor surfaces: dependence on doping density and redox concentration in the system n-GaAs/Br−, BrO−3 and n-GaAs/Fe2+, Fe3+

✍ Scribed by W. Plieth; S. Wetzenstein


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
545 KB
Volume
39
Category
Article
ISSN
0013-4686

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