𝔖 Bobbio Scriptorium
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Mechanical stability of reactive ion-etched poly (methylmethacrylate) and polyimide microstructures in trilevel electron beam lithography: James A Oro et al, J Appl Phys, 53 (11), 1982, 7379–7384


Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
147 KB
Volume
35
Category
Article
ISSN
0042-207X

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