✦ LIBER ✦

Measurements on MIS structures at infrasonic frequencies

✍ Scribed by Nakhmanson, R. S. ;Erkov, V. G.

Book ID: 105361602
Publisher: John Wiley and Sons
Year: 1970
Tongue: English
Weight: 479 KB
Volume: 2
Category: Article
ISSN: 0031-8965
DOI: 10.1002/pssa.19700020324

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Circuit for measuring effective values a

Circuit for measuring effective values at infrasonic frequencies

✍ V. I. Kushpil'; V. I. Markov; L. F. Petrova 📂 Article 📅 1964 🏛 Springer US 🌐 English ⚖ 239 KB

Measurement of current and voltages at i

Measurement of current and voltages at infrasonic frequencies

✍ V. P. Karpenko 📂 Article 📅 1962 🏛 Springer US 🌐 English ⚖ 218 KB

Schematic for measuring phase difference

Schematic for measuring phase differences at infrasonic frequencies

✍ V. D. Stashuk 📂 Article 📅 1967 🏛 Springer US 🌐 English ⚖ 197 KB

Methods for measuring electrical paramet

Methods for measuring electrical parameters of dielectrics at infrasonic frequencies

✍ I. V. Dzyubenko 📂 Article 📅 1970 🏛 Springer US 🌐 English ⚖ 458 KB

Dielectric measurements on PWB materials

Dielectric measurements on PWB materials at microwave frequencies

✍ A. Tanwar; K. K. Gupta; P. J. Singh; Y. K. Vijay 📂 Article 📅 2006 🏛 Springer-Verlag 🌐 English ⚖ 100 KB

Improvement of oxide thickness determina

Improvement of oxide thickness determination on MOS structures using capacitance–voltage measurements at high frequencies

✍ L. Soliman; E. Duval; M. Benzohra; E. Lheurette; K. Ketata; M. Ketata 📂 Article 📅 2001 🏛 Elsevier Science 🌐 English ⚖ 111 KB

It is well known that capacitance-voltage (C2V) measurements provide a simple determination of oxide thickness, but with the scaling down of components the classical method is not appropriated any more. We have observed that for two devices with the same oxide thickness and different surfaces, the c