A procedure for the determination of the interface layer thickness between the bulk Ðlm and the Si substrate SiO 2 from single-wavelength null ellipsometric data is described. The e †ect of the angular errors in the angle of incidence is eliminated because it is found along with the Ðlm and interfac
✦ LIBER ✦
Measurement of the thickness dependence of absorption in HfO2 and ZnS single-layer films
✍ Scribed by F. Coriand; H.-G. Walther; E. Welsch; D. Schäfer; R. Wolf
- Publisher
- Elsevier Science
- Year
- 1985
- Tongue
- English
- Weight
- 321 KB
- Volume
- 130
- Category
- Article
- ISSN
- 0040-6090
No coin nor oath required. For personal study only.
📜 SIMILAR VOLUMES
Measurement of the interface layer thick
✍
Easwarakhanthan, T.; Alnot, P.
📂
Article
📅
1998
🏛
John Wiley and Sons
🌐
English
⚖ 161 KB
Thickness dependence of the electrical a
✍
A.K. Saxena; S.P. Singh; R. Thangaraj; O.P. Agnihotri
📂
Article
📅
1984
🏛
Elsevier Science
🌐
English
⚖ 358 KB
Orientation and thickness dependence of
✍
M. Fukamachi; S. Nagakura; S. Oketani
📂
Article
📅
1966
🏛
Elsevier Science
⚖ 395 KB
## Orientation and thickness dependence of stress-strain curves in vacuum deposited single crystal silver films\* Mechanical properties of thin f.c.c. metal films formed by vacuum deposition have been studied by several authors.~~-?j Thev reported that the stress-" strain curves of the deposited f
The thickness dependence of Mössbauer ab
✍
John M. Williams; John S. Brooks
📂
Article
📅
1975
🏛
Elsevier Science
⚖ 661 KB
Thickness and doping dependence of the o
✍
V. Chacorn; D. Haneman
📂
Article
📅
1988
🏛
Elsevier Science
🌐
English
Thickness and temperature dependence of
✍
Junzo Umemura; Satoshi Takeda; Takeshi Hasegawa; Tohru Takenaka
📂
Article
📅
1993
🏛
Elsevier Science
🌐
English
⚖ 519 KB